Speaker
Jung-Sik Yoon
Description
See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/O2.302.pdf
Current Status of Etching Process Diagnostics and Simulations based on
Atomic and Molecular Data
Jung-Sik Yoon1, Mi-Young Song1, Deuk-Chul Kwon1
1 Plasma Technology Research Center, National Fusion Research Institute, Gunsan, Korea
The semiconductor industry’s continued trend of manufacturing device features on the
nanometer scale requires increased plasma processing control and improved understanding
of plasma characteristics and plasma-material interactions. As interest has increased, the
role of simulation and diagnostics of processing plasmas become more important in
understanding the effects of charged particles and radicals in plasma applications. Also, in
order to understand the behavior and properties of chemically active plasma, scientific data
such as atomic and molecular data have become a rapidly growing area of scientific
endeavor that holds great promise for practical applications for industrial application fields.
Thus, in this presentation, we review the current status of plasma diagnostics and
simulation based on atomic & molecular data aspect and identify the most important data
needs in future plasma research.
