Speaker
Kostiantyn Achkasov
Description
See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/O2.301.pdf
Design and performance of solid-state microwave plasma sources
for lab and industrial applications
K. Achkasov1, L. Latrasse1, J. Lo2 and P. Guillot2
1
SAIREM SAS, 12 Porte du Grand Lyon, 01700, Neyron, France
2
Diagnostic Research Team, CUFR Jean François Champollion,
Place de Verdun, 81012, Albi, France
Microwaves (MW) are frequently used to produce high density plasmas for industrial and
laboratory applications presenting several advantages when compared to RF and DC
discharges such as high reactive species density and no need for electrodes. Technological
advances over the last few years calls for large-scale processing with high density and
uniform plasma at reduced pressure. To meet these industrial requirements Aura-Wave [1],
an electron cyclotron resonance coaxial plasma source and Hi-Wave, a collisional plasma
source, have been designed. Multiple sources can be distributed together in the same reactor.
Using the solid-state technology allows the sources to be self-adapted [2] on a wide range of
operating conditions: gas type, pressure, MW power.
Atmospheric plasma sources are widely requested in applications such as surface
functionalization, elementary analysis, creation of radicals and reactive species as well as a
broad use in medicine (sterilization/disinfection, treatment of chronic wounds, etc.). For
these purposes, a compact plasma source S-Wave has been developed. It can operate in the
range of a few 10-2 mbar to atmospheric pressure and is able to create and maintain plasma
columns with variable lengths. An ignition system based on dielectric barrier discharge
allows to breakdown easily even at atmospheric pressure.
Fig. 1. (a) Aura-Wave ECR MW plasma source; (b) Multisource reactor with 8 off ×
Aura-Waves. Argon, total MW power 160 W, 1 Pa. (c) Photo of the atmospheric plasma
created by S-Wave (without incorporated ignition system). Argon, MW power 200 W.
References
1. S. Béchu, S., Bès, A., Lacoste, A., Pelletier, J, Device and method for producing
and/or confining a plasma, Patent WO 2010049456.
2. Latrasse, L., Radoiu, M., Jacomino, J.-M., Grandemenge, A., Facility for microwave
treatment of a load, Patent WO 2012146870.
