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EPS 2018 Programme

Jul 2 – 6, 2018
Žofín Palace
Europe/Prague timezone

Session

LTDP

Jul 2, 2018, 4:30 PM
Žofín Palace

Žofín Palace

Slovanský ostrov 226, 110 00 Praha 1

Conveners

LTDP

  • U. Cvelbar

Description

Chair: U. Cvelbar

Presentation materials

There are no materials yet.

  1. 5321. I1.301 Challenges for the development of plasma-based atomic layer processing - numerical and experimental analyses of plasma-exposed surface reactions at the atomic level
    Satoshi Hamaguchi
    7/2/18, 4:30 PM
    Talk
    See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/I1.301.pdf Challenges for the development of plasma-based atomic layer processing − numerical and experimental analyses of plasma-exposed surface reactions at the atomic level Satoshi Hamaguchi and Kazuhiro Karahashi Center for Atomic and Molecular Technologies, Osaka...
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  2. 5322. I1.302 Plasma-surface interaction studies: Development and application of advanced laser-based diagnostics
    Jean-Pierre Hubertus van Helden
    7/2/18, 5:00 PM
    Talk
    See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/I1.302.pdf Plasma-surface interaction studies: Development and application of advanced laser-based diagnostics N. Lang1, A. D. F. Puth1, S.-J. Klose1, G. Kowzan2, S. Hamann1, J. Röpcke1, P. Maslowski2, J. H. van Helden1 1 Leibniz Institute for Plasma Science and...
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  3. 5323. I1.303 Sensitive measurement of sheath electric field by Stark spectroscopy using the Balmer-alpha line of atomic hydrogen
    Koichi Sasaki
    7/2/18, 5:30 PM
    Talk
    See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/I1.303.pdf Sensitive measurement of sheath electric field by Stark spectroscopy using the Balmer-alpha line of atomic hydrogen K. Sasaki and S. Nishiyama Division of Quantum Science and Engineering, Hokkaido University, Sapporo, Japan The measurement of sheath...
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  4. 5324. I1.304 Application of the PI-VM (Plasma Information based Virtual Metrology) for management of the plasma processes in OLED display manufacturing
    Seolhye Park
    7/2/18, 6:00 PM
    Talk
    See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/I1.304.pdf Application of the PI-VM (Plasma Information based Virtual Metrology) for management of the plasma processes in OLED display manufacturing S. Park1,2, T. Cho1, J. Lee1, Y. Jang1, J.-J. Hong1, W.-H. Jang1, and G.-H. Kim2 1 Samsung Display Co., Ltd, Chungcheongnam-do, Korea ...
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