Speaker
Seongchan kang
Description
See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/P1.3017.pdf
Characterization of TiO2 thin films elaborated via atmospheric pressure
plasma: influence of the plasma gas composition
Seongchan kang1, Rodolphe Mauchauffé2, and Se Youn Moon1,2
1
Department of Applied Plasma Engineering, Chonbuk National University, Jeonju,
Republic of Korea
2
Department of Quantum System Engineering, Chonbuk National University, Jeonju,
Republic of Korea
Nowadays, titanium dioxide (TiO2) is being widely investigated for its interesting physical,
chemical and optical properties and for its various industrial applications, such as high
refractive index coatings, anti-corrosion coatings and photocatalytic coatings. Thanks to the
strong interest for TiO2 thin films deposition for industrial application, various methods of
fabrication are developed. Among the several TiO2 thin films deposition methods, i.e. CVD
(Chemical vapor Deposition), PVD (Physical Vapor Deposition), PECVD (Plasma
Enhanced Chemical Vapor Deposition) and APP-CVD (Atmospheric Pressure
Plasma-Chemical Vapor Deposition), the latter one is a promising method for low-cost and
in-line deposition because of its atmospheric pressure processing and fast deposition rate.
Despite the successful deposition of TiO2 thin films by APP-CVD, studies on the TiO2 thin
films growth mechanism using various plasma gases are still lacking and thus a thoughtful
investigation is necessary.
In this work, we studied the chemical composition and morphology of thin films deposited
using a helium/argon/titanium isopropoxide (TTIP) gas mixture. To do so, the He/Ar/TTIP
ratio is tuned and both the thin films surface chemistry, morphology and plasma chemistry
are investigated using X-Ray Photoelectron Spectroscopy (XPS), Scanning Electron
Microscope (SEM) and Optical Emission Spectroscopy (OES) respectively.
