Speaker
Q. Wang
Description
See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/P1.3020.pdf
Pulse Assistant RF Discharge and Its Application on NO and SO2 Removal
Q. Wang, C. S. Sang
Key Laboratory of Materials Modification by Laser, Ion and Electron Beams (Ministry of
Education), School of Physics, Dalian University of Technology, Dalian, China
Nitrogen oxide (NO) and Sulphur dioxide (SO2) are the components most difficult to remove
in air pollutions. As the plasma techniques, removal efficiency is determined by many factors,
among which the power source is particularly important and the discharge driven by pulse
assistant radio frequency (rf) source was studied in our previous work [1-5]. Then, removal
of NO is investigated in capacitive atmospheric pressure discharges driven by both radio rf
and trapezoidal pulse power with a one-dimensional self-consistent fluid model [6]. The
results show that the number density of NO could be reduced obviously once a low duty ratio
short pulse is additionally applied on the rf power. NO removal process of the pulse
modulated rf discharge could be divided into three stages: the quick reaction stage, the NO
removal stage, and the sustaining stage, respectively. Furthermore, the temporal evolutions
of particle densities are analysed, and the key reactions in the stages are discovered. Finally,
the SO2 purification with the pulse assistant RF discharge is also investigated.
References
[1] Wang Q, Sun J Z, Zhang J H, et al., Phys. Plasmas 17 (2010), 053506.
[2] Wang Q, Sun J Z, Nozaki T, et al. Phys. Plasmas 21 (2014), 083503.
[3] Wang Q, Sun J Z, Zhang J H, et al. Phys. Plasmas 20 (2013) 043511.
[4] Wang Q, Sun J Z, Wang D Z, IEEE Trans. Plasma Sci. 40 (2012), 35.
[5] Wang Q, Yu X L, Wang D Z, Chin. Phys. B 26 (2017) 035201.
[6] Wang Q, Wang Y H, Wang H C, et al., Plasma Sci. Technol. 19 (2017) 064013.
*This work was supported by “the Fundamental Research Funds for the Central Universities”
with Grant No. DUT18LK31, and “National Natural Science Foundation of China” with
Grant No. 11405022.
