Speaker
EunHee Choi
Description
See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/P4.3009.pdf
A study of asymmetrical effects in a 3D Inductively Coupled Plasma
discharge simulation of including multiphysics.
EunHee Choi1, YeJin Shon1, Dong-Gil Kim1, Deuk-Chul Kwon2, HeeHwan Choe1
1
School of Electronics and Information Engineering, Korea Aerospace University,
Goyang, Gyeonggi 10540, Republic of Korea
2
Plasma Technology Research Center, National Fusion Research Institute,
Gunsan, Jeollabuk 34133, Republic of Korea
A 3-dimensional plasma simulation for an inductively coupled plasma (ICP) discharge based
on the fluid model in semiconductor manufacturing process is conducted in this study. Heat
transfer and gas flow are merged to the plasma simulation for considering several physical
phenomena simultaneously.
Electron energy distribution function (EEDF) has great role in determining important
coefficients such as electron mobility, diffusion coefficient, electron-neutral reaction rates and
so on. Therefore, EEDF was obtained by Two-term Boltzmann Solver using space-averaged
plasma properties (electron density, electron temperature, gas temperature, ionization degree,
molar fraction, etc).
The effects of asymmetrical structure of the antenna coil and that of the discharge chamber
are investigated. 3D effects were observed, which could not be found in the 2D axisymmetric
simulation. Changes by an insertion of metal plate between antenna and plasma, including
Faraday shield effect, were also observed.
Acknowledgement
This research was supported by the National Research Council of Science & Technology(NST)
grant by the Korea government (MSIP) (No. CAP-17-02-NFRI).
