Speaker
Yejin Shon
Description
See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/P4.3011.pdf
A two-dimensional study of the capacitively coupled plasma discharge
considering the effects of multiphysics
Yejin Shon1, Eunhee Choi1, Deuk-Chul Kwon2, HeeHwan Choe1
1
School of Electronics and Information Engineering, Korea Aerospace University,
Goyang, Republic of Korea
2
Plasma Technology Research Center, National Fusion Research Institute,
Gunsan, Republic of Korea
*Corresponding author. Email address: choehh@kau.ac.kr
Plasma simulation methods were used to analyze discharge characteristics including the flow
and heat transfer of the gas in the capacitively coupled plasma discharge. In this study, two -
dimensional axisymmetric structure was assumed, which is common in the semiconductor
device processes. Laminar flow model was used to calculate flow, heat transfer was
considered to determine the temperature of the gas. Fluid description of plasma model was
combined with flow and heat transfer models. Also, electron energy distribution function
(EEDF) was obtained using two - term Boltzmann approximation. The plasma region was
divided multiple zones, to consider the spatial variation of EEDF. Standing wave effect in the
plasma discharge was added to investigate the electromagnetic field effect according to
process conditions and driving frequencies.
This research was supported by the National Research Council of Science & Technology(NST) grant by the
Korea government (MSIP) (No. CAP-17-02-NFRI).
