Speaker
Khaled Hassouni
Description
See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/P4.3002.pdf
Self-consistent simulation of hydrogen-methane plasmas for CVD
diamond deposition
S. Prasanna1 , A. Michau1 , C. Rond1 , K. Hassouni1 , A. Gicquel1
1 Laboratoire des Sciences des Procédés et des Matériaux, UPR3407, CNRS,
Universite Paris 13, avenue Jean-Baptiste Clément, 93430 Villetaneuse (France)
MW assisted hydrogen methane plasmas have
been extensively used for growth of CVD dia- 3000
mond and graphene. In this article, we discuss the
T (K)
2000
results of self-consistent simulation of hydrogen- CH4 0.5%
1000 CH4 4%
Hyd
methane plasmas in a microwave resonating cav-
0 0.02 0.04 0.06 0.08 0.1 0.12 0.14
ity at high pressure conditions (110-200mbar) and z (m)
0.5
different concentrations of methane. Details of the
0.4
self-consistent model is provided elsewhere [1].
XH
0.3
0.2
The results indicate that the pressure, power and
0.1
concentration of methanne in the H2 −CH4 methane 0
0 0.02 0.04 0.06 0.08 0.1 0.12 0.14
z (m)
affect the characteristics of the coupling between
MW and plasma. Figure 1 shows the gas temper- Figure 1: Effect of methane on the tem-
ature and atomic hydrogen concentration at a pres- prature and atomic hydrogen mole frac-
sure of 200 mbar and power 2500 W. The results tion at 200 mbar and 2500 W at the axis
are in agreement with experimental observations. It of the plasma reactor
is seen that the addition of methane increases the
temperature of the reactor. As a result the the dissociation of hygrogen increases with addi-
tion of methane. The results are similar at 110 mbar. n general, the plasma characteristics is a
function of methane concentration, pressure and MW power.
References
[1] S. Prasanna et al. Plasma Sources Science and Technology 26.9 (2017)
