Speaker
Dong Hun Shin
Description
See the full Abstract at http://ocs.ciemat.es/EPS2018ABS/pdf/P2.3012.pdf
Destruction of PFCs gas using microwave plasma operating at a low
pressure
D. H. Shin1, S. M. Chun1, Y. C. Hong1
1
Plasma Technology Research Centre, National Fusion Research Institute (NFRI), Gunsan,
Korea
The perfluorocompounds (PFCs) gases are used mainly in industrial processes for production
of display, semiconductor, metal, and etc. The PFCs are greenhouse gases with atmospheric
lifetimes of more than 1000 years. They are powerful greenhouse gases and today’s
emissions will still be affecting earth’s climate in the next millennium. The microwave
plasma operated in a low pressure chamber for destruction of PFCs gases in this study. The
microwave plasma was operated in a closed and isolated environment may provide an
opportunity for the mass production of chemically active radicals for various chemical and
biological processes. The operation at a low pressure of microwave plasma would be
economical cost of capital, maintenance, and operational compared to other plasma devices.
The electric field induced in a quartz discharge tube by microwave radiation break down the
gas at a sufficiently low pressure, igniting the plasma, which is continuously sustained by the
microwave radiation. The plasma profile at a low pressure was asymmetric with higher
density on the incoming side of the microwaves. This behavior of the plasma inhibits
high-power operation of microwave plasma at a low pressure. However, the asymmetry of
the plasma profile disappears under a high gas flow rate. Destruction of PFCs gas indicates
that the microwave plasma used at a low pressure can efficiently produce an abundance of
chemical radicals.
REFERENCES:
[1] Y. C. Hong, et al, “Microwave plasma torch operating at a low pressure for material processing”, Thin Solid
Films, 517, 4226, 2009.
